Download PDF by Kazuo Nojiri: Dry Etching Technology for Semiconductors

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By Kazuo Nojiri

This booklet is a must have connection with dry etching know-how for semiconductors, as a way to allow engineers to strengthen new etching techniques for extra miniaturization and integration of semiconductor built-in circuits. The writer describes the gadget production circulate, and explains within which a part of the stream dry etching is basically used. The content material is designed as a pragmatic consultant for engineers operating at chip makers, gear providers and fabrics providers, and college scholars learning plasma, targeting the themes they wish so much, corresponding to particular etching methods for every fabric (Si, SiO2, steel and so forth) utilized in semiconductor units, etching apparatus utilized in production fabs, clarification of why a specific plasma resource and gasoline chemistry are used for the etching of every fabric, and the way to strengthen etching processes. The newest, key applied sciences also are defined, resembling 3D IC Etching, twin Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.

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Dry Etching Technology for Semiconductors by Kazuo Nojiri

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